The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 1991
Filed:
Nov. 21, 1990
Masaji Nishikawa, Tokyo, JP;
Olympus Optical Co., Ltd., Tokyo, JP;
Abstract
A method of manufacturing an ion flow recording head of this invention is a method of manufacturing an ion flow recording head which has an ion flow controller in which a first electrode, a first insulating layer, a second electrode, a second insulating layer, and a third electrode are sequentially stacked, and ion flow passage holes are formed in predetermined portions of the multilayered structure. The second electrode is divided into two planar electrodes, i.e., a second-A electrode and a second-B electrode, and the first electrode, the first insulating layer, and the second-A electrode are integrated to constitute a first member. The second-B electrode, the second insulating layer, and the third electrode are integrated to constitute a second member. The first and second members are integrated by adhering the second-A and second-B electrodes to constitute the ion flow controller.