The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 1991
Filed:
Jul. 19, 1990
Rexford J Abbott, San Jose, CA (US);
David L Wright, Redwood City, CA (US);
Spectra-Physics Lasers, Inc., Mountain View, CA (US);
Abstract
An apparatus for applying a load to an etalon so as to enable the accurate tuning of desired frequencies or ranges of frequencies. The invention includes first and second optical surfaces separated and disposed highly parallel with respect to each other by an electric longitudinal spacer member. A biasing means applies a longitudinal load to the elastic longitudinal spacer member. The applied load is uniformly distributed throughout the spacer member by a longitudinal load distribution means, which is disposed between said biasing means and at least one of said optical surfaces. The distance, d, between the first and second optical surface is directly proportional to the load applied by the biasing means. The load may be varied, in one embodiment of the invention, using a bias adjustment means acting in mechanical cooperation with the biasing means.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile