The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 1991
Filed:
Sep. 21, 1989
Applicant:
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F / ;
U.S. Cl.
CPC ...
364578 ; 364488 ;
Abstract
A topography simulation method enables estimation of the three-dimensional shape of a surface of a workpiece where material removal by a predetermined process takes place. This simulation method includes the steps of dividing a region of the workpiece to be removed into a plurality of partial regions; setting a diffusion coefficient for each partial region with a diffusion component contributing to material removal, and calculating a contour surface of the concentration of the diffusion component by a process which employs modified diffusion equations. The contour surface obtained the surface after material removal.