The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 1991

Filed:

Oct. 22, 1990
Applicant:
Inventors:

Takashi Nakamura, Minami, JP;

Toshio Kurokawa, Odawara, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430421 ; 430372 ; 430393 ; 430400 ; 430428 ; 430430 ; 430431 ; 430455 ; 430460 ; 430461 ; 354322 ;
Abstract

A processing tank is partitioned into a plurality of compartments which are serially connected to define a continuous processing path having an entrance and an exit for photosensitive material. The path is filled with a processing solution having a desilvering function such that the processing solution in at least one compartment has a different composition from the processing solution in at least one of the remaining compartments. Silver halide photosensitive material is successively passed through the compartments without contact with the ambient air. Desilvering the photosensitive material after exposure and development in this way reduces the amount of processing solution used, especially replenished, while achieving improved photographic properties.


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