The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 1991
Filed:
Feb. 17, 1989
Huels Aktiengesellschaft, Troisdorf, DE;
Abstract
Disclosed is a method for the processing of the residues that occur in the production of chlorosilane. The processing is performed by the separation of the residual chlorosilanes, followed by hydrolysis of these residues with water vapor. The water vapor used has a temperature between 100.degree. and 300.degree. C. and additionally contains hydrogen chloride. The hydrolysis residues occurring in the present method have an extremely small chloride content and can be transported, if desired, directly to a dump. The hydrogen chloride that is released can be absorbed in water and removed as hydrochloric acid or can be desorbed for further technical use. Preferably it is reused for chlorosilane production.