The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 1991
Filed:
Feb. 07, 1990
Tetsuro Fukui, Kawasaki, JP;
Hiroshi Fukumoto, Kawasaki, JP;
Masato Katayama, Yokohama, JP;
Kozo Arahara, Kawasaki, JP;
Kenji Kagami, Atsugi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A photosensitive material comprises a photosensitive and heat-developable element and a photopolymerizable element which are contained in the same layer. The photopolymerizable element comprises at least a polymerizable polymer precursor having a melting point of 35.degree. C. or more. The photosensitive material is exposed to light with at least one wavelength within the wavelength region of from 400 nm to 900 nm, heated at 60.degree. to 180.degree. C., and exposed to light with at least one wavelength within the wavelength region of from 250 to 700 nm, and thus an unexposed area in the photosensitive layer which is an area not exposed to light with at least one wavelength within the wavelength region of from 400 nm to 900 nm is polymerized.