The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 1991

Filed:

Feb. 23, 1989
Applicant:
Inventor:

John J Bockman, Santa Clara, CA (US);

Assignee:

Hewlett-Packard Company, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356351 ; 356358 ; 356363 ;
Abstract

A linear-and-angular measuring plane mirror interferometer measures two degrees of freedom, both linear translation and rotation angle, using a single interferometer optical assembly. In alternate orientations it can be used to measure either the pitch, roll or yaw angle. The linear-and-angular measuring interferometer splits the measurement beam at the interferometer optic, using a single integrated optical assembly to make measurements at two locations on a measuring mirror on a stage. In a first embodiment, the input beam is split, and two separate measurements, X and X', are made at two locations separated by a distance d. A second embodiment optically produces a direct measurement of X--X' at a detector. The input beam makes one interferometer measurement for X, then the polarization of part of the resulting output beam is rotated and the rotated part of the beam is returned for a second pass to make an interferometer measurement at a location offset by a distance d from the first pass measurement.


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