The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 1991

Filed:

Nov. 16, 1989
Applicant:
Inventors:

Victor Curreri, Steauket, NY (US);

John Klein, Port Washington, NY (US);

Janine Dubois, Shirley, NY (US);

Assignee:

Grumman Aerospace Corporation, Bethpage, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F / ; H05B / ;
U.S. Cl.
CPC ...
364503 ; 219494 ; 340588 ; 364557 ; 374137 ;
Abstract

The present invention monitors thermocouple data from a semiconductor furnace. The data is checked against a first set of profiles which mimic an intended operational temperature profile for the furnace. If the temperature measured in any zone of the furnace falls outside a first set of maximum and minimum limits fixed by the mimicking profiles, a warning is generated thereby giving operational personnel an opportunity to correct the condition. If the condition remains unchecked and further deviation occurs, a second condition is reached as defined by a corresponding second set of mimicking maximum and minimum profiles. This condition is established as a serious condition which will cause a microprocessor to terminate power supply to the furnace. Otherwise, the quality of the grown crystal would be jeopardized; or sufficiently excessive power would be delivered to the furnace so as to cause its damage or destruction.


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