The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 1991
Filed:
Oct. 26, 1989
Applicant:
Inventors:
Masatoshi Takita, Niigata, JP;
Takaaki Shimizu, Niigata, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C / ;
U.S. Cl.
CPC ...
501 54 ; 428426 ; 501 11 ; 501 12 ; 501 53 ;
Abstract
The invention provides a synthetic silica glass article or tool for a dopant-diffusing process in semiconductors, which is quite satisfactory in use in respect of the outstandingly small creeping at high temperatures, by working from a silica glass block having such a creeping characteristic that the elongation under a tension of 62.5 g/mm.sup.2 at a temperature of 1250.degree. C. does not exceed 0.025% after 5 minutes.