The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 1991
Filed:
May. 30, 1990
Lorin K Hansen, Fremont, CA (US);
Edwardo D Lara, Sacramento, CA (US);
William A Lloyd, Los Altos, CA (US);
Jack H Sayre, St. John, CA;
Stephen D White, Santa Clara, CA (US);
Xerox Corporation, Stamford, CT (US);
Abstract
In a device for producing an electrostatic image along a scan line of a recording medium by means of a recording device including an array of stylus electrodes arranged in a series of groups cooperable with a series of complementary electrodes, each of the stylus electrode groups cooperates with a portion of two adjacent complementary electrodes whereby writing is accomplished by imposing a charge pattern upon the recording medium in the region of a stylus electronic group when both the stylus electrode group and its cooperating pair of complementary electrodes are actuated contemporaneously. As each complementary electrode is actuated it induces a non-uniform residual potential distribution in the recording medium of a portion of the region of the next adjacent stylus electrode group. The electrostatic writing method comprises first perturbing a region of the recording medium by imposing a first non-uniform residual potential distribution on one portion thereof coextensive with the overlapping portion of a complementary electrode, then perturbing another portion of the same region by imposing a second non-uniform residual potential distribution thereon coextensive with the overlapping portion of another adjacent complementary electrode, wherein the first and second non-uniform residual potential distributions tend to cancel one another, and then writing a charge pattern upon the entire region.