The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 1991
Filed:
Sep. 24, 1990
Anthony D Gingello, Rochester, NY (US);
David F Jennings, Penfield, NY (US);
Richard D Lucitte, Holcomb, NY (US);
Hermano P Rocha, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A high-contrast room-light-handleable black-and-white silver halide photographic film especially adapted for use as a dry-dot-etchable contact film in the graphic arts is comprised of a support having in order on one side thereof (1) a radiation-sensitive layer comprising silver halide grains, a hydrophilic colloid and a polymer latex, (2) an interlayer comprising a hydrophilic colloid and a polymer latex, and (3) an overcoat layer comprising a hydrophilic colloid, a matting agent and a light-scattering agent, wherein the interlayer has a refracive index in the range of from about 1.4 to about 1.7 and a thickness which is in the range of from about 0.5 to about 5 microns and is at least twice that of the overcoat layer. The combination of the light-scattering agent in the overcoat layer and the thick interlayer facilitates optical spreading of the image during contact exposure, and thereby enhances the performance of the contact film in use with multi-layer originals and in processes of dry dot etching.