The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 1991
Filed:
Jul. 09, 1990
Jerry W Shoen, Middletown, OH (US);
Armco Inc., Middletown, OH (US);
Abstract
A process of producing high silicon, low melt carbon regular grain electrical silicon steel having a final gauge of from 14 mils (0.35 mm) to about 6 mils (0.15 mm) or less, including the steps of providing a hot band and removing the hot band scale, if needed. The silicon steel is cold rolled to intermediate gauge and subjected to an intermediate anneal at a soak temperature of about 1650.degree. F. (900.degree. C.) to about 1700.degree. F. (930.degree. C.). Thereafter, the silicon steel is cooled in a first stage slow cooling at a rate of about 500.degree. F. (280.degree. C.) to about 1050.degree. F. (585.degree. C.) per minute down to about 1100.degree. F..+-.50.degree. F. (595.degree. C..+-.30.degree. C.). The silicon steel is then subjected to a second stage fast cooling down to from about 600.degree. F. (315.degree. C.) to about 1000.degree. F. (540.degree. C.) at a cooling rate of from about 2500.degree. F. (1390.degree. C.) to about 3500.degree. F. (1945.degree. C.) per minute followed by a water quench. The silicon steel is cold rolled to final gauge, decarburized, coated with an annealing separator and final annealed. Preferably, but optionally, the hot band is annealed prior to the first cold rolling. Preferably, but optionally, the final gauge silicon steel prior to decarburization is subject to an ultra-rapid annealing treatment at a rate greater than 180.degree. F. (100.degree. C.) per second to a temperature greater than 1250.degree. F. (675.degree. C.).