The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 1991
Filed:
Jul. 16, 1990
Hsin-Pang Wang, Rexford, NY (US);
Yuan Pang, North Reading, MA (US);
General Electric Company, Schenectady, NY (US);
Abstract
A method for controlling process conditions in a continuous skull nozzle process is provided wherein one or more process parameters are controlled to maintain the operation of the process within a process window derived using integral solutions and expressed in terms of dimensionless parameters. The process window defines a range of values for the controllable process parameters within which a steady state solidified skull will be maintained and outside of which a steady state solidified skull will not be maintained. A pressure differential between the inside of a crucible holding the melt and outside of the crucible is one process parameter which is controlled to adjust the melt discharge flow rate to maintain operation within the process window.