The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 1991

Filed:

Apr. 02, 1990
Applicant:
Inventor:

Jacob Y Wong, Santa Barbara, CA (US);

Assignee:

Gaztech Corporation, Goleta, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
73 3102 ; 356437 ;
Abstract

A sample chamber for use in measuring the absorption of radiation as it passes through a gas within the chamber includes a block having an extended serpentine passage through it. The walls of the extended passage are coated with a highly reflective material so that the extended passage acts as a light pipe for transmitting the radiation. A number of smaller passages permit gases in the space surrounding the sample chamber to diffuse into the extended passage through which the radiation is conducted. The sampling chamber is made by joining two halves, each of which has a planar face in which an elongated groove is produced. The halves are molded of plastic and in quantity the chamber is quite inexpensive.


Find Patent Forward Citations

Wong, Jacob. (1991). Gas sample chamber (U.S. Patent No. 5060508). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5060508

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…