The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 1991

Filed:

Mar. 30, 1990
Applicant:
Inventor:

Ronnie Northrup, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2502 / ; 25022729 ;
Abstract

A mask for reducing a semiperiodic variation of an output signal produced in response to a semiperiodic temporal variation of a distribution of radiation incident on the input of a detector. The mask can have a transmitance that changes abruptly at an outer profile of an opaque region or can have a varation in transmittance that varies continuously.


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