The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 1991

Filed:

Jul. 24, 1990
Applicant:
Inventors:

Wasaburo Ohta, Yokohama, JP;

Masashi Nakazawa, Yokohama, JP;

Assignee:

Ricoh Company, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ; C23C / ; C23C / ;
U.S. Cl.
CPC ...
118723 ; 118715 ; 118725 ;
Abstract

A thin film forming apparatus for forming a thin film on a substrate with a vaporized source material being supplied from an external material supplying unit. The thin film forming apparatus comprises a vacuum chamber for providing a vacuum pressure at which the vaporized source material is deposited on the substrate, a material supplying part for supplying particles constituting the vaporized source material to the vacuum chamber, an electrode for holding the substrate, a grid for allowing the particles to travel from the material supplying part to the electrode through the grid, a filament for generating thermions to ionize the particles, a power supply for applying a voltage to the grid so that the grid has a positive potential when measured with respect to the electrode and with respect to the filament, a plurality of openings being formed on the material supplying part for directing the emitted particles from the plurality of openings toward the substrate, and an emission uniforming material for uniforming the quantity of the emitted particles.


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