The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 1991

Filed:

Oct. 17, 1988
Applicant:
Inventors:

Ganapati Mauze, Sunnyvale, CA (US);

Robert R Holloway, Montara, CA (US);

Darlene J Spira-Solomon, Stanford, CA (US);

Assignee:

Hewlett-Packard Company, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ; G01N / ;
U.S. Cl.
CPC ...
422 56 ; 422 57 ; 422681 ; 422 8207 ; 422 8208 ; 128634 ; 128636 ; 356 39 ; 514 63 ; 385123 ;
Abstract

A dimensionally-stable organosilicon material composition and method for producing the material composition including noncrosslinkable, continuous phase silicone with silica filler material dispersed therethorugh, and having dissolved therein a variably-radiative material (e.g., ruthenium dye) responsive to the concentration of a selected analyte (e.g., oxygen), and the products of a reaction between water and a modifier material selected for establishing the sensitivity of said variably-radiative material to the selected analyte.


Find Patent Forward Citations

Mauze, Ganapati. (1991). Chemically sensitive, dimensionally-stable organosilicon material (U.S. Patent No. 5057277). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5057277

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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