The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 1991
Filed:
Jul. 24, 1990
Applicant:
Inventors:
James P Edler, Troy, MI (US);
Bohdan Lisowsky, Troy, MI (US);
Assignee:
Eaton Corporation, Cleveland, OH (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C04B / ;
U.S. Cl.
CPC ...
501 97 ; 501 98 ; 501 96 ; 264-5 ; 264 65 ; 423353 ;
Abstract
A process for preparing a nitridable silicon-containing material, which process includes (a) comminuting a slurry of silicon powder, water, at least one densification aid, including Al.sub.2 O.sub.3, and another densification aid, the comminuting performed to cause substantial chemical reaction between the silicon and the water; and (b) reducing the water content of the reacted slurry to form a dry mass. In another embodiment, at least one nitriding agent may be added to aid any nitridation which may be performed.