The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 1991

Filed:

May. 30, 1989
Applicant:
Inventor:

Martin F Finlan, Aylesbury, GB;

Assignee:

Amersham International Plc, Buckinghamshire, GB;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ; G01N / ;
U.S. Cl.
CPC ...
422 8205 ; 422 681 ; 422 8209 ; 422 66 ; 356318 ; 356445 ; 436 44 ; 436805 ; 435808 ;
Abstract

The present invention is drawn to a surface plasmon resonance (SPR) sensor in which the phenomenon of long-range surface plasmon resonance is used to develop a highly sensitive detector for use in biological, biochemical or general chemical testing. The sensor includes a laminar structure having of a high refractive index glass block, a membrane of dielectric material, a thin metal layer, and a sensitive layer. A sample to be tested is brought into contact with the sensitive layer. The refractive index of the dielectric layer and that of the layer (sensitive layer/sample) on the opposite side of the metallic layer should be equal, or nearly so, and the refractive index of the glass block should be higher than this so that total internal reflection takes place at the interface between the block and the membrane. Light from a laser source is totally internally reflected at this interface, and the strength of the reflected beam is monitored by a light detector. Provided conditions are correct, long-range SPR will take place which will sensitively alter the strength of the light in dependence upon the progress of the reaction between the sensitive layer and sample.


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