The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 1991
Filed:
Feb. 26, 1990
Eric B Hochberg, Altadena, CA (US);
California Institute of Technology, Pasadena, CA (US);
Abstract
A process for extracting long-equivalent wavelength interferometric information from a two-wavelength polychromatic or achromatic interferometer. The process comprises the steps of simultaneously recording a non-linear sum of two different frequency visible light interferograms on a high resolution film and then placing the developed film in an optical train for Fourier transformation, low pass spatial filtering and inverse transformation of the film image to produce low spatial frequency fringes corresponding to a long-equivalent wavelength interferogram. The recorded non-linear sum irradiance derived from the two-wavelength interferometer is obtained by controlling the exposure so that the average interferogram irradiance is set at either the noise level threshold or the saturation level threshold of the film.