The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 1991
Filed:
Sep. 24, 1990
Narasimha S Raghavan, Kingston, CA;
Roland S Timsit, Kingston, CA;
Alcan International Limited, Montreal, CA;
Abstract
A gas distributing device is provided for a Metal Organic Chemical Vapor Deposition (MOCVD) reactor. The gas distributing device comprises a packed bed of discrete particles located in the inlet of the reactor to provide a vortex-free flow of reactant gas mixture towards the susceptor within the reactor chamber. The packed bed of discrete particles is of sufficient depth to provide a series of tortuous interconnecting channels around and between the particles and through the bed. A porous support is provided for the packed bed in the inlet of the reactor chamber. The porous support device adjacent the reactor chamber permits a reactant gas mixture after having passed through the packed bed to enter the reactor chamber.