The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 1991
Filed:
Aug. 07, 1989
Johannes A Bernsen, Eindhoven, NL;
Reinier van den Boomgaard, The Hague, NL;
U.S. Philips Corp., New York, NY (US);
Abstract
A method of recognizing a pattern in a field having a multi-valent amplitude, and a device for performing the method, uses association with a reference mask which is composed of logic high units and logic low units. The reference mask is sub-divided into two sub-masks, units having the same logic value belonging to the same sub-mask. The first and the second sub-mask contain relevant logic high units and logic low units, respectively. After the positioning of the sub-masks in the field, a relatively lowest and a relatively highest value of the amplitude are determined within the window of the first and the second sub-mask, respectively. When the difference formed by the relatively lowest value minus the relatively highest value is not negative, the desired pattern can in principle be recognized in the field. The device for performing the method includes at least one rank-value filter for determining the relatively highest value and the relatively lowest value. There is also determined the sign of the difference between the relatively lowest value and the relatively highest value.