The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 1991

Filed:

Apr. 24, 1990
Applicant:
Inventors:

Kazuaki Sakoda, Otsu, JP;

Kazuhiko Kominami, Otsu, JP;

Masao Iwamoto, Otsu, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11C / ; G03C / ;
U.S. Cl.
CPC ...
430270 ; 430495 ; 430945 ; 3461351 ; 365119 ;
Abstract

Disclosed is an optical recording material comprising a porphine derivative having at least an ionic group and a polymer compatible with this porphine derivative. As the porphine derivative, there are used a porphine derivative having an N-alkylpyridinium group, such as 5,10,5,20-tetra(4-N-methylpyridinium) porphine, a porphine derivative having a quaternary amino group, such as 5,10,15,20-tetra(4-N,N,N-trimethylaminophenyl) porphine, a porphine derivative having a sulfonatophenyl group, such as 5,10,15,20-tetra (4-sulfonatophenyl) porphine, and a porphine derivative having a carbonatophenyl group, such as 5,10,15,20-tetra-(4-carbonatophenyl) porphine. Either an organic polymer or an inorganic polymer is used as the polymer. From the viewpoint of the recording stability, a water-soluble polymer such as polyvinyl alcohol or sodium polystyrene sulfonate is preferred as the organic polymer. Silica glass synthesized by using tetramethoxysilane or tetraethoxysilane as the starting material is used as the inorganic polymer. In the optical recording material, a thermally stable hole can be formed at a temperature higher than the liquid helium temperature, and therefore, attenuation of the formed holes after elevation of the temperature is small and the recording stability is high. Moreover, a formation of hole at the liquid nitrogen temperature can be carried out.


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