The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 1991
Filed:
Mar. 20, 1989
Christine J Landry, Honeoye Falls, NY (US);
Bradley K Coltrain, Fairport, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
Free standing, optically clear, poly(acrylate) or poly(methacrylate) film having dispersed therein silica which is produced in situ from an alkoxysilane, using acid catalysis and a substantially stoichiometric amount of water for hydrolysis. The film forming process comprises a drying and curing step conducted in an open system. The temperatures and pH employed determine the nature and morphology of the dispersed silica phase. The film-forming process is conducted in the substantial absence of a polymerizable substance other than the alkoxysilane.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile