The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 1991

Filed:

May. 04, 1989
Applicant:
Inventors:

John F Asmus, La Jolla, CA (US);

Ralph H Lovberg, San Diego, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
29 2501 ; 29 2502 ; 20419225 ; 427 541 ;
Abstract

A system for processing the surface of semiconductor material for annealing and etching purposes. The system established a high intensity ultraviolet light which is repetitively pulsed to rapidly raise the surface temperature of the semiconductor material to a predetermined temperature for either etching or annealing purposes.


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