The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 1991

Filed:

Nov. 28, 1989
Applicant:
Inventors:

John B Keable, Knoxville, TN (US);

Steve Bostic, Atlanta, GA (US);

Assignee:

Delphi Technology, Inc., Atlanta, GA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D / ; G03D / ;
U.S. Cl.
CPC ...
354320 ; 354324 ;
Abstract

A system of substantially closed processing stations designed to disperse chemicals for uniformly coating or otherwise contacting an emulsion-coated or other surface or strip is disclosed. The system comprises one or more slotted stations through which developing chemicals are transmitted into shallow sinks. The chemicals uniformly contact the strip as it travels over the sinks and subsequently are removed from the strip along with by-products of the reaction by wipers or ribs and disposed through disposal slots in the stations. The ribs also agitate the chemicals and emulsion to assist uniform developing of the strip. Because the processing station is virtually sealed from the surrounding atmosphere, little degradation of the processing chemicals occurs even after extended periods of nonuse.


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