The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 1991

Filed:

Jul. 20, 1988
Applicant:
Inventors:

Malcolm R Beasley, Palo Alto, CA (US);

Kookrin Char, Seoul, KR;

Theodore H Geballe, Woodside, C;

Robert H Hammond, Los Altos, CA (US);

Aharon Kapitulnik, Palo Alto, CA (US);

Andy Kent, Chene, CH;

Michio Naito, Tokyo, JP;

Byungdu Oh, Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ; B05D / ; B05D / ;
U.S. Cl.
CPC ...
505-1 ; 505731 ; 505742 ; 505730 ; 20419224 ; 427 62 ; 427 531 ; 427 38 ;
Abstract

A method of forming a superconducting YBa.sub.2 Cu.sub.3 O.sub.7-x thin film with selected crystal orientation is described which comprises the steps of sputtering simultaneously Y, Ba and Cu onto the surface of a substrate, introducing oxygen at said surface during deposition, controlling the stoichiometry of the elements Y, Ba or both richer or poorer than the 1:2:3 stoichiometry within a few atom percent and followed by annealing to selectively grow an a-axis or a c-axis oriented film of YBa.sub.2 Cu.sub.3 O.sub.7-x.


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