The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 1991
Filed:
Nov. 15, 1989
Applicant:
Inventors:
Barbara Charlet, Meylan, FR;
Louise Peccoud, Claix, FR;
Assignee:
Commissariat a l'Energie Atomique, Paris, FR;
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156656 ; 156657 ; 1566591 ; 156662 ; 156345 ; 20419237 ; 252 791 ;
Charlet, Barbara. (1991). Process for etching by gas plasma (U.S. Patent No. 5047115). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5047115
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile