The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 1991
Filed:
Jul. 17, 1990
Paul R West, Fort Collins, CO (US);
James E Mitchell, Windsor, CO (US);
Gary R Miller, Fort Collins, CO (US);
Paul R Josephson, Jr, Fort Collins, CO (US);
Raymond W Ryan, Jr, Fort Collins, CO (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
Radiation-sensitive compositions which are especially useful in the production of negative-working lithographic printing plates comprise a photocrosslinkable polymer containing the photosensitive group ##STR1## as an integral part of the polymer backbone and, in an amount sufficient to improve the properties of the composition, both a poly(N-acyl-alkyleneimine) and an unsaturated polyester such as a polyester derived from fumaric acid and a 4,4'-isopropylidenediphenol. The combination of a poly(N-acylalkyleneimine) and an unsaturated polyester improves the properties of the radiation-sensitive composition in regard to such factors as shelf life, image contrast, developability, ink receptivity and reduction in mottle and thereby provides a superior lithographic printing plate.