The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 1991
Filed:
Dec. 01, 1989
Hiroaki Andoh, Tokyo, JP;
Michio Ohshima, Tokyo, JP;
Yuji Matsui, Tokyo, JP;
Takashi Okuyama, Tokyo, JP;
Toshitaka Yoshimura, Tokyo, JP;
Hidetaka Yamaguchi, Tokyo, JP;
Yasushi Ikeda, Tokyo, JP;
Jun Nonaka, Tokyo, JP;
Tamihiro Miyoshi, Tokyo, JP;
Mitsuo Kakimoto, Tokyo, JP;
Masatoshi Iwama, Tokyo, JP;
Hideyuki Morita, Tokyo, JP;
Satoru Tachihara, Tokyo, JP;
Akira Morimoto, Tokyo, JP;
Akira Ohwaki, Tokyo, JP;
Asahi Kogaku Kogyo Kabushiki Kaisha, Tokyo, JP;
Abstract
A monitor mechanism for use with a scanning optical apparatus in which the direction of polarization is utilized to separate a source laser light beam into a pattern drawing and a monitor beamlet and to synthesize them again into a single after passing through a scanning lens and beam deflector. The two beamlets can thus be controlled so as to project towards the deflector and scanning lens in the same direction, which is effective in reducing the offset between the pattern drawing and monitor beams that may occur on account of such factors as variations in lens performance.