The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 1991

Filed:

Feb. 17, 1988
Applicant:
Inventors:

Nobuhiro Fukuhara, Ohmuta, JP;

Setsuo Yoshino, Yokohama, JP;

Kaoru Yamamoto, Yokohama, JP;

Satori Sone, Yokohama, JP;

Maki Suzuki, Yokohama, JP;

Yoshiyuki Nakajima, Yokohama, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12N / ; C12N / ; C12N / ; C12N / ; C12N / ;
U.S. Cl.
CPC ...
4351723 ; 435 691 ; 435 711 ; 435 91 ; 435170 ; 435232 ; 43525253 ; 4353201 ; 435849 ; 536 27 ; 935-6 ; 935-8 ; 935-9 ; 935 22 ; 935 29 ; 935 33 ; 935 38 ; 935 39 ; 935 59 ; 935 60 ; 935 61 ; 935 66 ; 935 73 ;
Abstract

Escherichia coli carrying a hybrid plasmid having been constructed by inserting a desired foreign gene into an expression vector so as to permitting expression of said desired foreign gene therein was cultured at a temperature 40.degree. C. or over so that the expression of said desired foreign gene was suppressed. This E. coli (i.e., transformant) was cultured at 40.degree. C. or over in a first process to suppress the expression of the foreign gene and to support sufficient cell growth and thereafter below 40.degree. C. in a second process to release the suppression of the expression so as to permit effective production of the foreign gene product, which resulted in high concentration of the foreign gene product in the final culture.


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