The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 1991

Filed:

Mar. 12, 1990
Applicant:
Inventors:

Hansjorg Furrer, Ziefen, CH;

Norbert Richle, Remetschwil, CH;

Willi Heusser, Forch, CH;

Assignee:

Lonza Ltd., Gampel/Valais, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24C / ;
U.S. Cl.
CPC ...
51411 ; 51416 ; 51436 ; 406 32 ; 406124 ;
Abstract

The device has a storage vessel (2) that is connected to a compressed gas pipe (1) and whose outlet (6) discharges through a shut-off element (7) into a carrier gas pipe (10). Shut-off element (7) and the setpoint values of a first pressure regulator (23) in compressed gas pipe (1), as well as a second pressure regulator (24) in carrier gas pipe (10), are controlled by a program control device (33) with a program memory (34), in which several programs that are selectable by a selector (37) for charging the carrier gas stream with varying amounts of material and/or material concentrations are stored. Each program contains time-driven switching commands for opening and closing shut-off element (7) and two different setpoint values for first and second pressure regulator (23, 24). With the device, the carrier gas stream, for example, for descaling hollow billets of varying dimensions, can be charged selectively with different, precisely measured amounts of material and material concentrations (amounts of material per carrier gas volume), by which charging with different amounts of material or material concentrations can be done in quick succession.


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