The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 1991

Filed:

Dec. 01, 1989
Applicant:
Inventors:

Susan P Westbrook, Fairport, NY (US);

Christopher J Olan, Gates, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
355245 ; 118657 ; 355251 ;
Abstract

An improved magnetic brush development apparatus for applying developer material to a latent electrostatic image wherein the set up latitude between the replenishment roller and replenishment skive wall is increased. The development apparatus includes a housing defining a sump portion adapted to contain a supply of developer material. A magnetic brush is located substantially within the housing in spaced relation to the sump portion for applying developer material to the latent image. A feed mechanism located within the housing between the sump portion and the magnetic brush transports developer material from the sump to the magnetic brush, and a mechanism located in the sump portion agitates developer material and transports developer material to the feed mechanism. The development apparatus further includes a developer material replenishment device which has a reservoir for replenishment material adjacent to the sump portion, a flow communication path between the reservoir and the sump portion, and a selectively rotatable roller located relative to the path to control flow of replenishment material through the path. The entrance to the path is configured to engage the roller such that the set up latitude between the roller and path is increased.


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