The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 1991
Filed:
Nov. 12, 1986
Isao Gotoh, Yokohama, JP;
Hajime Yoneda, Ichihara, JP;
Seisaku Kumai, Tokyo, JP;
Tohru Ueno, Yokohama, JP;
Asahi Glass Co., Ltd., Tokyo, JP;
Abstract
A process for producing trifluoroacetic acid and trifluoroacetyl chloride from 1,1-dichloro-2,2,2-trifluoroethane, oxygen and water as starting materials, characterized in that the starting materials are reacted in a vapor phase in a reactor of perfect mixing type to avoid local heating, under a condition not to liquefy the starting materials and reaction products, while continuously supplying the starting materials and continuously withdrawing the reaction products, so as to obtain a reaction mixture comprising trifluoroacetyl chloride as the main product and trifluoroacetic acid as an accompanying product.