The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 1991
Filed:
Mar. 13, 1989
Tetsuro Fukui, Kawasaki, JP;
Kazuo Yoshinaga, Machida, JP;
Hideaki Mitsutake, Tokyo, JP;
Katsuya Oikawa, Mitaka, JP;
Shinsuke Takeuchi, Yokohama, JP;
Takeshi Miyazaki, Ebina, JP;
Yoshio Takasu, Tama, JP;
Akihiro Mouri, Atsugi, JP;
Masato Katayama, Yokohama, JP;
Kazuo Isaka, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A photosensitive material comprises a photosensitive and heat-developable element, and further a light-to-heat conversion element or a nonlinear optical function element. The photosensitive and heat-developable element comprises at least a photosensitive silver halide, an organic silver salt and a reducing agent. The light-to-heat conversion element comprises at least one of an inorganic metal and an organic coloring matter. The nonlinear optical function element comprises a comprises a compound selected from the group consisting of an inorganic crystal, an organic crystal, a polymer, a polymeric liquid crystal, a polymeric composition and a polymeric liquid crystal composition. An image forming method employing the photosensitive material comprises the steps of imagewise exposing the material by use of a laser beam, heating the material and forming a polymer image on the material.