The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 1991
Filed:
Feb. 09, 1990
Applicant:
Inventors:
Teruo Miyashita, Shizuoka, JP;
Koichi Ito, Tokyo, JP;
Assignees:
Nippon Light Metal Company, Limited, Tokyo, JP;
Applied Materials, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J / ; H01H / ; C23F / ;
U.S. Cl.
CPC ...
20419232 ; 156345 ; 156643 ; 118723 ; 20429831 ;
Abstract
A plasma forming electrode used in pairs disposed in mutually facing spaced parallel relation in a reduced pressure treating chamber, and between which a radio frequency current power is applied to produce a plasma, is formed from preferably highly pure aluminum or an aluminum alloy, and has a chromic acid anodic surface film layer thereon. It has greatly improved durability when used for plasma treatment in the presence of fluorine containing gas.
Miyashita, Teruo. (1991). Plasma forming electrode and method of using the same (U.S. Patent No. 5039388). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5039388
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile