The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 1991

Filed:

Dec. 06, 1989
Applicant:
Inventors:

Keiko Kushida, Kunitachi, JP;

Hiroshi Takeuchi, Matsudo, JP;

Yukio Ito, Machida, JP;

Hiroshi Kanda, Tokorozawa, JP;

Kazuhiro Sugawara, Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ; B44C / ; C03C / ;
U.S. Cl.
CPC ...
310334 ; 156643 ; 156644 ; 156647 ; 156656 ; 1566591 ; 156667 ; 310364 ; 310365 ; 428137 ;
Abstract

A thin film pattern and a method of fabricating the thin film pattern available for an ultrasonic transducer are disclosed. That is, an oriented thin film made of a material different from the material of a substrate is formed on the substrate, a mask having a predetermined pattern is formed on the thin film, and anisotropic etching is carried out for the thin film in accordance with the predetermined pattern of the mask, by using an etchant for selectively etching a predetermined crystallographic plane parallel to the surface of the thin film, to form the predetermined pattern in the thin film, thereby obtaining a thin film pattern.


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