The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 1991
Filed:
Aug. 03, 1990
Applicant:
Inventors:
Moriaki Akazawa, Itami, JP;
Takahiro Maruyama, Itami, JP;
Toshiaki Ogawa, Itami, JP;
Hiroshi Morita, Itami, JP;
Tomoaki Ishida, Itami, JP;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ; C23C / ;
U.S. Cl.
CPC ...
21912143 ; 2191214 ; 156646 ; 20429817 ; 20429837 ;
Abstract
A plasma etching apparatus comprises a chamber, a holding table for holding samples, such as a semiconductor substrate to be etched, in the chamber, a plasma-generating device for generating a plasma within the chamber, and a magnetic-field-forming device which forms a magnetic field perpendicular to the surface of the sample placed on the holding table and parallel the inner wall of the chamber.