The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 1991
Filed:
Dec. 13, 1988
Andreas H Hogt, Enschede, NL;
John Meijer, Deventer, NL;
Peter Hope, Twello, NL;
Jernej Jelenic, Deventer, NL;
Akzo N.V., , NL;
Abstract
Organic (co)polymers, including saturated (co)polymers, are modified by contacting them with an organic peroxide and decomposing the peroxide. Use is made of an organic peroxide having the general formula: R--(O--O--CHR.sup.1 --CR.sup.2 .dbd.CR.sup.3 R.sup.4)N, wherein N is 1, 2 or 3; R.sup.1 is H, C.sub.1 -C.sub.4 alkyl or C.sub.2 -C.sub.4 alkylene; R.sup.2, R.sup.3 and R.sup.4 are, independently, H or C.sub.1 -C.sub.4 alkyl; two of the substituents R.sup.1 -R.sup.4 together may form C.sub.3 -C.sub.12 alkylene; and, when N is 1, R is an optionally hydroxyl substituted C.sub.4 -C.sub.18 T.alkyl, P-menth-8-yl, C.sub.5 -C.sub.18 T.alkenyl, 1-vinylcyclohexyl or a group of the formula: --C(CH.sub.3)2--C.sub.6 HJ(5--M)--R.sup.5 (M), wherein M is 0, 1 or 2 and R.sup.5 is isopropenyl or 2-hydroxyisopropyl; when N is 2, R is a C.sub.8 -C.sub.12 alkylene or alkynylene group having a tertiary structure at both ends, or a group having the formula: --(C)CH.sub.3)2)2--C.sub.6 H(4--X)--R.sup.5 (X), wherein X is 0 or 1; and when N is 3, R is 1,2,4-or 1,3,5-triisopropylbenzene-alpha, alpha'-triyl, i.a., 3-allylperoxy-3,3-dimethylpropene according to a preferred embodiment the modification is carried out in the presence of a coagent, whereby the advantageous polymer properties, such as adhesion to polar materials, are further enhanced.