The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 1991
Filed:
Oct. 19, 1982
Hitachi, Ltd., Tokyo, JP;
Abstract
A row composed of reaction vessels is arranged on a turntable and one unit of sample dispenser mechanism as well as one photometer and a plurality units of reagent feeding mechanism are arranged near the turntable. After a sample is added to one specified reaction vessel, the turntable is rotated by 180.degree. or more and stopped so as to advance the reaction vessel containing said sample by half a revolution plus one cell. During this rotation, approximately half of all the vessels cross the light path of the photometer for the absorbance of fluid in each vessel to be measured. A reagent is added to the specified reaction vessel at the next stop position after sampling in order to start reaction. The turntable is again rotated and stopped so as to advance the reaction vessel by half a revolution plus one cell. During this rotation, the reaction vessel crosses said light path of the photometer for the absorbance of the reaction fluid to be measured. The reaction vessel stops at the second reaction vessel position beyond the initial sample adding position. During the course of repeated rotations, the specified reaction vessel crosses the light path of said photometer a number of times and is stopped at said sample adding position after it is washed to be ready for further use.