The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 1991
Filed:
Apr. 04, 1990
Matsushita Electric Ind., Ltd., Kadama, JP;
Abstract
A sputtering apparatus for producing a thin film with use of a laser beam is disclosed. The sputtering apparatus comprises a vacuum chamber, a target and a substrate disposed inside the vacuum chamber, a laser beam-projecting unit, a beam-shape adjusting unit, an optical scanning unit, and a light-converging unit. The optical scanning unit comprises a mirror which rotates to allow the laser beam to scan the target, and the angular speed thereof is regulated so as to move the spot of the laser beam at a fixed speed on the target. The beam-shape adjusting unit or the light-converging unit moves along its optical axis in synchronization with the movement of the mirror of the optical scanning unit, thereby keeping the spot of the laser beam at a predetermined size.