The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 1991
Filed:
Jul. 18, 1990
Satoshi Takeuchi, Tokyo, JP;
Abstract
A fine pattern is formed by the following steps. A prescribed mask pattern of an electrically insulative material is formed on an electroconductive surface of a base plate of a printing plate, so that the part, other than the mask pattern, of the printing plate becomes an electroconductive printing pattern part. Then, electrolysis is carried out in an electrolyte containing an electrodeposition substance as an ingredient with the printing plate as one electrode and with an opposing electrode, both immersed in the electrolyte, so that the electrodeposition substance is deposited on the electroconductive printing pattern part of the printing plate. Thereafter, the printing plate is withdrawn out from the electrolyte, washed and dried. Then, the deposited substance is transferred onto the surface of a printing object such as a plate of glass or plastic, for forming a pattern thereon. Thereafter, the surface of the printing object is etched with the electrodeposited substance thus transferred as an erosion resistant material. The transfer of the electrodeposition substance without consistency from the printing plate onto the surface of the printing object, followed by etching of the printing object surface, enables an accurate reproduction of a fine pattern on the printing object.