The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 1991
Filed:
Feb. 23, 1989
Toshihiko Karasaki, Osaka, JP;
Kazumi Sugitani, Osaka, JP;
Minolta Camera Kabushiki Kaisha, Osaka, JP;
Abstract
An optical system for detecting focusing condition comprises a pair of image re-forming lenses and an aperture mask. The image re-forming lenses are configured with a pair of plano-convex lenses having equal radius of curvature R and an equal axial thickness T. R is nearly equal to T (R.apprxeq.T). The aperture mask has apertures corresponding to the respective plano-convex lenses and is attached closely to the flat surfaces of the plano-convex lenses. Comatic aberrations for the respective light fluxes passing through the apertures become nearly same, and therefore point images formed by the respective light fluxes also become nearly same. Consequently, high accuracy of focusing condition detection is established.