The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 1991
Filed:
Mar. 08, 1990
Tadasi Sonobe, Iwaki, JP;
Mamoru Katane, Hitachi, JP;
Takashi Ikeguchi, Hitachi, JP;
Manabu Matsumoto, Ibaraki, JP;
Shinjiro Ueda, Abiko, JP;
Toshiaki Kobari, Chiyoda, JP;
Takao Takahashi, Hitachi, JP;
Toa Hayasaka, Atsugi, JP;
Toyoki Kitayama, Isehara, JP;
Hitachi, Ltd., Tokyo, JP;
Nippon Telegraph and Telephone Corp., Tokyo, JP;
Abstract
Synchrotron radiation is generated when a base of charged particles is bent by a bending magnet. The synchrotron radiation passes down a lead-out duct as the total number of pumps is limited by the size of the apparatus and many pumps are needed in order to achieve a good vacuum. An ion pump has a main magnetic field, normally generated by a magnet of the ion pump which controls the behavior of the electrons in the ion pump. However, the leakage magnetic field of the bending magnet affects the ion pump, and therefore the ion pump is arranged so that its main magnetic field is aligned with the leakage magnetic field at the ion pump, or at least with a main component thereof. In this way, the effect of the leakage magnetic field on the ion pump is reduced. Indeed, it is possible to use the leakage magnetic field as the main magnetic field of the ion pump.