The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 1991
Filed:
Jul. 10, 1989
Garry K Echterling, Bausman, PA (US);
John E Herweh, Lancaster, PA (US);
Armstrong World Industries, Inc., Lancaster, PA (US);
Abstract
An alkoxysilane bearing amic acid or derivative thereof is formed by reacting an aromatic or aliphatic dianhydride and an aminoalkyltrialkoxysilane or aminoaryltrialkoxysilane, or reacting an aromatic or aliphatic dianhydride and a diamine to form an amic acid which is reacted with an aminoalkylenetrialkoxysilane. A thin, hard protective silica glass network is formed by reacting the alkoxysilane bearing amic acid with an alkoxysilane, preferably tetraalkoxysilane, and an epoxy bearing silane coupling agnet in an acid catalyzed sol-gel process involving hydrolysis and condensation, which provides an amide/ester modified silica network. In a variation of this process, a polyamic acid bearing anhydride termination is prepared by reacting an excess of a dianhydride with a diamine. The product of this reaction when reacted with an aminoalkylenetrialkoxysilane provides an alkoxysilane bearing oligomeric polyamic acid. The latter product yields an imide modified silica network when subjected to acid catalyzed hydrolysis and condensation with tetraalkoxysilane.