The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 1991

Filed:

Jun. 27, 1989
Applicant:
Inventors:

Hideharu Tamura, Tokyo, JP;

Kazufumi Ogawa, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B / ;
U.S. Cl.
CPC ...
2041576 ; 20415764 ; 20415774 ; 20415776 ; 427 35 ; 427 36 ; 427 531 ; 427 541 ; 4274301 ;
Abstract

A method for the formation of monomolecular adsorption films of a silane compound having a diacetylene bond is described. The silane compound is chemically adsorbed on a substrate through .dbd.SiO-- bonds and the resultant film is significantly reduced in number of defects such as pinholes. When the monomolecular film is irradiated with actinic light, the diacetylene bonds are convered into a conjugated diacetylene polymer. Similarly, a built-up film of a desired number of monomolecular layers of a silane compound having an acetylene bond formed on a substrate by chemical adsorption and a corresponding number of monomolecular layers of an aliphatic acid or alcohol having an acetylene bond and alternately deposited on the first-mentioned layer is also provided.


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