The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 1991
Filed:
Jan. 29, 1990
Applicant:
Inventor:
Kunio Suzuki, Hamamatsu, JP;
Assignee:
Yamaha Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K / ; G01N / ;
U.S. Cl.
CPC ...
378 35 ; 378 34 ; 378 62 ;
Abstract
In composition of a mask for X-ray lithography made up of a substrate and one or more metallic pattern layer of high soft X-ray absorption, conventional ceramic for the substrate is replaced by Be. High X-ray permeability of Be allows use of a thick construction for the substrate, thereby raising mechanical properties of the mask and assuring clear contrast in X-ray exposure of resist. Closeness in thermal expansion between the substrate and the pattern layer precludes the danger of undesirable separation, warping and breakage.
Suzuki, Kunio. (1991). Mask for x-ray lithography (U.S. Patent No. 5034971). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5034971
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile