The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 1991
Filed:
Jun. 09, 1989
Applicant:
Inventors:
Assignee:
Mitsubishi Rayon Co., Ltd., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
560218 ;
Abstract
A process for purifying methyl methacrylate which comprises treating methyl methacrylate having a purity of 99.5% or more containing a trace of impurities with a sulfonic acid group-containing compounds. According to the present invention, there can be obtained highly purified methyl methacrylate which exhibits an absorbance of 0.02 or less in a range of wavelength of 400-500 nm according to the sulfuric acid color method and is free of even a trace of furan-type compounds.
Quick Actions:
Yoshioka, Teruhiko. (1991). Process for purifying methyl methacrylate (U.S. Patent No. 5034558). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5034558
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile