The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 1991
Filed:
Oct. 01, 1990
Shih-Wei Sun, Austin, TX (US);
Michael P Woo, Austin, TX (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
A process for forming a feature on a substrate without etching into the surface of the substrate and causing recessed regions. A first layer of material is deposited to overlie the substrate and is formed of a different material to the substrate. The first layer is patterned, using conventional photolithography, to form windows in the first layer of material which expose a substrate surface. The etch selectively etches the first layer of material without substantially etching into the substrate material. A second layer of material, which is the same material as the substrate, is deposited to overlie the first layer of material and makes physical contact with the substrate through the windows patterned in the first layer. The second layer is blanket etched so that isolated regions are formed in regions defined by the windows patterned in the first layer.