The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 1991
Filed:
Aug. 17, 1990
Masayuki Kurematsu, Tokyo, JP;
Shigeharu Koboshi, Tokyo, JP;
Syozo Aoki, Tokyo, JP;
Masahiko Kon, Tokyo, JP;
Konishiroku Photo Industry Co., Ltd., Tokyo, JP;
Abstract
Disclosed is a method of processing a light-sensitive silver halide color photographic material comprising; subjecting to exposure a light-sensitive silver halide color photographic material comprising a support; a light-sensitive silver halide emulsion layer containing at least one of a core/shell silver halide grain containing 3.0 mole % or more of silver iodide and a tabular silver halide grain containing 3.0 mole % or more of silver iodide; and a compound capable of releasing at a developing processing a restrainer or restrainer precursor which forms silver salt having the solubility product with a silver ion, of 1.times.10.sup.-9 or less, and thereafter; carrying out a color developing processing by using a color developing solution containing an aromatic primary amine type color developing agent, for a period of 120 seconds or less and so as to have a value of (developed silver amount at the maximum density portion)/(total silver amount), of 0.5 or less. The method of processing a light-sensitive silver halide color photographic material according to this invention can accomplish improvements of graininess and sharpness, and also prevention of surface-peeling of the light-sensitive silver halide color photographic material and scratch of an emulsion surface during the processing.